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US 2014/0209242 A1Published application
Substrate processing chamber components incorporating anisotropic materials
AssigneeApplied Materials, Inc.
InventorsJENNIFER Y. SUN, BIRAJA PRASAD KANUNGO
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Abstract
Substrate processing chamber components for use in substrate processing chambers are provided herein. In some embodiments, a substrate processing chamber component may include a body having a first surface, one or more heat exchangers disposed within the body below the first surface, and one or more anisotropic layers, wherein a separate anisotropic layer is disposed between each of the one or more heat exchangers and the first surface.
Claims20
A substrate processing chamber component, comprising:
- a body having a first surface;
- one or more heat exchangers disposed within the body below the first surface;
- and
- one or more anisotropic layers, wherein a separate anisotropic layer is disposed between each of the one or more heat exchangers and the first surface.
1 more element
A substrate processing chamber, comprising:
- a processing volume defined by a top chamber wall, a bottom chamber wall and a plurality of side walls;
- and
- a substrate processing chamber component disposed within the processing volume, wherein the substrate processing chamber component comprises
- a body having a first surface,
- one or more heat exchangers disposed within the body below the first surface, and
- one or more anisotropic layers, wherein a separate anisotropic layer is disposed between each of the one or more heat exchangers and the first surface.
3 more elements
Dependencies are inferred from the claim text.