Facility for microwave treatment of a load

A facility for microwave treatment of a load, comprising:

• at least one application device for applying an electromagnetic wave in the microwave range;
• at least one electromagnetic wave generator in the microwave range of the solid-state generator type, connected to at least one application device by means for guiding the electromagnetic wave;
• a frequency adjustment system for the or each generator, designed to adjust the frequency f(i) of the electromagnetic wave produced by the corresponding generator;
• a measurement system for the or each application device, designed to measure the power reflected PR(i) by the corresponding application device;
• and
• automated control means connected to the or each frequency adjustment system and designed to control the adjustment of the frequency f(i) of the electromagnetic wave by the or each frequency adjustment system and connected, on the other hand, to the or each measurement system in order to:
• e1) receive, as input and in real-time, the reflected power measurement PR(i) from the or each measurement system;
• and
• e2) command the or each frequency adjustment system to vary the frequency f(i) of the electromagnetic wave produced by the or each generator, until at least one of the following conditions is met:
• a) the reflected power PR(i) measured by the or each measurement system substantially reaches a first reference value VR(i);
• or
• b) the power transmitted PT(i) by the or each application device substantially reaches a second reference value VT(i), the transmitted power PT(i) corresponding to the difference between the incident power PIN(i) transmitted to the corresponding application device and the reflected power PR(i) measured on that same application device, or the following relationship:
• PT(i)=PIN(i)−PR(i).