Back to results
US 2014/0197326 A1Published application
Charged particle beam writing method
AssigneeNuFlare Technology, Inc.
InventorTakayuki OHNISHI
Life of this patent
Estimating the term…
Abstract
A charged particle beam writing method comprising, an irradiation step of irradiating a sample with a charged particle beam emitted from a charged particle source, a first blanking step of performing the blanking while the charged particle beam is moved in a first direction from a position of the charged particle beam in the irradiation step; and a second blanking step of performing the blanking the charged particle beam is moved in a second direction opposite to the first direction from the position of the charged particle beam in the irradiation step.
Claims5
A charged particle beam writing method comprising:
- an irradiation step of irradiating a sample with a charged particle beam emitted from a charged particle source;
- a first blanking step of performing the blanking while the charged particle beam is moved in a first direction from a position of the charged particle beam in the irradiation step;
- and
- a second blanking step of performing the blanking the charged particle beam is moved in a second direction opposite to the first direction from the position of the charged particle beam in the irradiation step.
1 more element
Dependencies are inferred from the claim text.