Method for manufacturing a plurality of nanowires

A method for manufacturing an array of nanowires, the method comprising:

• forming at least one layer of a material to be processed over a substrate, such that an exposed surface of the material to be processed is provided;
• and
• applying a plasma etch process on the exposed surface of the material to be processed to thereby form a plurality of nanowires from the material to be processed during the plasma treatment.

A method for manufacturing a plurality of nanostructures, the method comprising:

• providing a wafer comprising an exposed surface area to be processed, wherein the exposed surface area comprises a material to be processed,
• applying a plasma etching on the exposed surface area, thereby forming a plurality of nanostructures from the material to be processed during the plasma etching.

A method for manufacturing a battery, the method comprising:

• forming a plurality of nanowires by providing a carrier comprising an exposed surface of a material to be processed, and applying a plasma treatment on the exposed surface of the material to be processed to thereby form a plurality of nanowires from the material to be processed during the plasma treatment;
• forming a layer stack over the plurality of nanowires, wherein the layer stack comprises at least one electrolyte layer, at least one cathode layer, and at least one cathode current collector layer, wherein the plurality of nanowires is at least part of an anode of the battery.