Inductively coupled plasma source

An inductively coupled plasma reactor, comprising:

• a chamber body having a processing volume;
• and
• an inductively coupled plasma apparatus supported by the chamber body to couple RF energy into the processing volume, comprising:
• a bottom wall comprising a hub and a ring coupled to the hub by a capacitor, wherein the hub and the ring are each electrically conductive, and where the hub has a central opening aligned with a central axis of the inductively coupled plasma apparatus;
• a top wall spaced apart from and above the bottom wall, wherein the top wall has a central opening aligned with the central axis, and wherein the top wall is electrically conductive;
• a sidewall electrically connecting the ring to the top wall;
• a tube electrically connecting the hub to the top wall, the tube having a central opening aligned with the central axis;
• a dielectric plate disposed below the bottom wall and comprising a gas distribution device axially aligned with the tube;
• a gas conduit fluidly coupled to the gas distribution device and extending through the central openings of the tube and the top wall;
• and
• a conductive coil wound about a portion of the tube and coupled to an electrically conductive portion of the apparatus.