Method and device for cleaning a brush surface having a contamination
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJiann-Lih WU, Jeng-Jyi HWANG, Soon-Kang HUANG, Chi-Ming YANG
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Abstract
A method for cleaning a brush surface having a contamination is provided. The method includes steps of: providing a mechanical wave; and stripping off the contamination from the brush surface by the mechanical wave.
Claims20
A method for cleaning a brush surface having a contamination, comprising steps of:
- providing a mechanical wave;
- and
- stripping off the contamination from the brush surface by the mechanical wave.
A method for cleaning a brush surface having a first surface charge and a contaminant particle having a particle surface having a second surface charge, wherein the first surface charge has an electric polarity the same with that of the second surface charge, comprising a step of:
- causing the second surface charge to be enhanced, so that the contaminant particle is repelled from the brush surface.
A device for cleaning a brush surface having a first surface charge and a contaminant particle having a particle surface having a second surface charge, wherein the first surface charge has an electric polarity the same with that of the second surface charge, comprising:
- a cleaning module configured to enhance the second surface charge on the particle surface, so that the contaminant particle is repelled from the brush surface.
Dependencies are inferred from the claim text.