Eeprom cell and eeprom device

Abstract

An EEPROM cell is provided which includes a control gate; a tunneling plate; a floating plate configured to form a capacitor area with the control plate and the tunneling plate; an inverter configured to sense a voltage level of the floating plate; a first transfer gate connected with the tunneling plate and configured to transfer an operating voltage selectively applied from first and second bit lines to the tunneling plate; a protection circuit connected with the inverter and configured to float the inverter at non-read or write/erase operations of an adjacent EEPROM cell; and a second transfer gate configured to transfer an output voltage of the inverter. This configuration is enable to use all the same gate oxide (i.e. 26 Å) and ultra low operation voltages (i.e. ±2V) in EEPROM cell.

Dependencies are inferred from the claim text.