Direct metalization of electrical circuit structures

Abstract

An electrical interconnect including a first circuitry layer with a first surface and a second surface. At least a first dielectric layer is printed on the first surface of the first circuitry layer to include a plurality of first recesses. A conductive material is plated on surfaces of a plurality of the first recesses to form a plurality of first conductive structures electrically coupled to, and extending generally perpendicular to, the first circuitry layer. A filler material is deposited in the first conductive structures. At least a second dielectric layer is printed on the first dielectric layer to include a plurality of second recesses generally aligned with a plurality of the first conductive structures. A conductive material is plated on surfaces of a plurality of the second recesses to form a plurality of second conductive structures electrically coupled to, and extending parallel to the first conductive structures.

Dependencies are inferred from the claim text.