Exposure condition determining method and surface inspection apparatus
AssigneeNikon Corporation
InventorHiroaki OKAMOTO
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Abstract
There is provided an exposure condition determining method for determining an exposure condition for an exposure-objective substrate having a plurality of semiconductor pattern features formed by predetermined exposure on a surface thereon, the method including, irradiating an illumination light onto a surface of a substrate, which has the pattern features, detecting a diffracted light from the plurality of semiconductor pattern features of the substrate irradiated with the illumination light, and determining the exposure condition based on a variation in brightness of the detected diffracted light.
Claims9
An exposure condition determining method for determining an exposure condition for an exposure-objective substrate having a plurality of semiconductor pattern features formed by predetermined exposure on a surface thereon, the method comprising:
- irradiating an illumination light onto a surface of a substrate, which has the pattern features;
- detecting a diffracted light from the plurality of semiconductor pattern features of the substrate irradiated with the illumination light;
- and
- determining the exposure condition based on a variation in brightness of the detected diffracted light.
A surface inspection apparatus comprising:
- an illumination section which irradiates an illumination light onto a substrate having a plurality of semiconductor pattern features formed on a surface thereof by a predetermined exposure;
- a detection section which is optically connected to the illumination section and which detects a diffracted light from the plurality of semiconductor pattern features of the substrate irradiated with the illumination light;
- and
- a computation section which performs a computation to determine a condition for an exposure of a substrate based on a variation in brightness of the detected diffracted light from the plurality of semiconductor pattern features.
Dependencies are inferred from the claim text.