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US 2014/0192339 A1Published application
Collector
AssigneeCarl Zeiss SMT GmbH
InventorsIngo Saenger, Joerg Zimmermann, Daniel Kraehmer, Johannes Ruoff, Martin Meier, Frank Schlesener, Christoph Hennerkes, Wolfgang Singer
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Abstract
A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum.
Claims21
1-14. (canceled)
A collector, comprising:
- a collector shell comprising a reflective section,
- wherein:
- the collector shell has a first focus and a second focus different from the first focus;
- the reflective section is configured so that during use of the collector:
- radiation is reflected from the first focus into the second focus;
- and
- a spectrum of angles of impingement on the reflective section is within a range of at most 10° around a predefined angle of impingement;
- and
- the collector is a microlithography collector.
6 more elements
A system, comprising:
- a radiation source configured to generate unpolarized radiation;
- and
- a collector comprising a collector shell comprising a reflective section configured so that, during use of the system when the unpolarized radiation emerges from the radiation source and impinges on the reflective section, the unpolarized radiation is reflected into an intermediate focus so that the reflected radiation at the intermediate focus has a uniform polarization,
- wherein the system is a microlithography illumination system.
1 more element
A method, comprising:
- impinging radiation on each reflective section of a collector shell within an angular range of at most 10° around a predefined angle of impingement for each reflective section,
- wherein each reflective section of the collector shell is configured so the radiation is reflected into a predefined focus, thereby producing uniformly polarized radiation.
Dependencies are inferred from the claim text.