Pixel Blending For Multiple Charged-Particle Beam Lithography

A system for processing image data in a lithography manufacturing process, comprising:

• a parallel imaging writer system, wherein the parallel imaging writer system includes a plurality of multiple charged-particle beam (MCB) imaging units arranged in one or more parallel arrays;
• a controller configured to control the plurality of MCB imaging units, wherein the controller includes
• logic for receiving a mask data pattern to be written to a substrate;
• logic for processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate;
• logic for identifying one or more objects in an area of the substrate to be imaged by corresponding MCB imaging units;
• and
• logic for performing multiple exposures to image the one or more objects in the area of the substrate by controlling the plurality of MCB imaging units to write the plurality of partitioned mask data patterns in parallel.