Electromechanical systems having sidewall beams

A method of manufacturing an electromechanical device, comprising:

• providing a substrate having a first electrode and a second electrode;
• and
• monolithically forming a movable shuttle on the substrate, wherein forming the shuttle includes
• forming a first wall and a second wall, each defining a vertical side of the shuttle and each having a first dimension at least four times larger than a second dimension, and
• forming a base positioned orthogonally to the first and second walls and defining a horizontal bottom of the shuttle, wherein the first and second walls are coupled to the base to form a corrugated structure,
• wherein the first wall and the first electrode define a first capacitor, and the second wall and the second electrode define a second capacitor.

A display comprising:

• a substrate having a first electrode and a second electrode;
• a plurality of microelectromechanical system (MEMS) shutters disposed on the substrate and configured to modulate light;
• and
• a movable shuttle monolithically integrated with the substrate, and having a first wall, a second wall, and a base, wherein the first and second walls each have a first dimension at least four times larger than a second dimension, and wherein the first wall, the second wall, and the base are coupled to substantially define a U-shape, and
• wherein the first wall and the first electrode define a first capacitor, and the second wall and the second electrode define a second capacitor.