Semiconductor Devices and Methods of Manufacture Thereof

A method of manufacturing a semiconductor device, the method comprising:

• forming a conductive material over a workpiece;
• forming an insulating material layer over the conductive material;
• patterning the insulating material layer to form a trench and expose a portion of a top surface of the conductive material in the bottom of the trench;
• and
• forming a barrier layer on sidewalls of the trench using a surface modification process and a surface treatment process.

A method of manufacturing a semiconductor device, the method comprising:

• forming a trench in a dielectric layer, the trench including sidewalls defined by the dielectric layer and a bottom defined by an underlying conductive structure;
• performing a surface modification that selectively modifies the dielectric sidewalls without modifying the underlying conductive structure;
• and
• performing a surface treatment that selectively treats the modified dielectric sidewalls without treating the underlying conductive structure to form a barrier layer on the dielectric sidewalls.