Method and Apparatus for a Semiconductor Structure
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsLi-Cheng Chu, Ping-Yin Liu, Xin-Hua Huang, Yuan-Chih Hsieh, Lan-Lin Chao, Chun-Wen Cheng
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsLi-Cheng Chu, Ping-Yin Liu, Xin-Hua Huang, Yuan-Chih Hsieh, Lan-Lin Chao, Chun-Wen Cheng
Estimating the term…
A semiconductor structure may include a first device having first surface with a first bonding layer formed thereon and a second device having a first surface with a second bonding layer formed thereon. The first bonding layer may provide an electrically conductive path to at least one electrical device in the first device. The second bonding layer may provide an electrically conductive path to at least one electrical device in the second device. One of the first or the second devices may include MEMS electrical devices. The first and/or the second bonding layers may be formed of a getter material, which may provide absorption for outgassing.
An apparatus, comprising:
An apparatus comprising:
A method of forming a semiconductor structure, comprising:
Dependencies are inferred from the claim text.