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AssigneeMicron Technology, Inc.
InventorWerner Jeungling
Life of this patent
Estimating the term…
Abstract
Methods and devices depicting fabrication of non-planar access devices having fins and narrow trenches, among which is a method that includes wet etching a conductor to form a recessed region and subsequently etching the conductor to form gates on the fins. The wet etching may include formation of recesses which are may be backfilled with a fill material to form spacers on the conductor. Portions of a plug may be removed during the wet etch to form overhanging spacers to provide further protection of the conductor during the dry etch.
Claims20
An access device, comprising:
- a first fin and a second fin separated by trench;
- a conductor disposed in the trench;
- and
- a first overhanging spacer formed on a first sidewall of the trench and a second overhanging spacer formed on a second sidewall second of the trench.
An access device, comprising:
- a fin having a first sidewall and a second sidewall;
- a first overhanging spacer formed on the first sidewall;
- and
- a second overhanging spacer formed on the second sidewall.
An access device, comprising:
- a fin having a lower doped region and an upper doped region;
- a conductor formed on a sidewall of the fin, adjacent to the lower doped region;
- and
- a overhanging spacer formed on the sidewall of the fin, adjacent to the upper doped region and on top of the conductor.
Dependencies are inferred from the claim text.