Crystalline thin-film transistor
AssigneeInternational Business Machines Corporation
InventorsBahman Hekmatshoartabari, Ning Ll, Devendra K. Sadana, Davood Shahrjerdi
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AssigneeInternational Business Machines Corporation
InventorsBahman Hekmatshoartabari, Ning Ll, Devendra K. Sadana, Davood Shahrjerdi
Estimating the term…
A method for forming a thin film transistor includes joining a crystalline substrate to an insulating substrate. A doped layer is deposited on the crystalline substrate, and the doped layer is patterned to form source and drain regions. The crystalline substrate is patterned to form an active area such that a conductive channel is formed in the crystalline substrate between the source and drain regions. A gate stack is formed between the source and drain regions, and contacts are formed to the source and drain regions and the gate stack through a passivation layer.
A method for forming a thin film transistor, comprising:
A method for forming a thin film transistor for displays, comprising:
-21. (canceled)
Dependencies are inferred from the claim text.