Group iii nitrides on nanopatterned substrates
AssigneeInternational Business Machines Corporation
InventorsCan Bayram, Devendra K. Sadana, Kuen-Ting Shiu
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AssigneeInternational Business Machines Corporation
InventorsCan Bayram, Devendra K. Sadana, Kuen-Ting Shiu
Estimating the term…
A patterned substrate is provided having at least two mesa surface portions, and a recessed surface located beneath and positioned between the at least two mesa surface portions. A Group III nitride material is grown atop the mesa surface portions of the patterned substrate and atop the recessed surface. Growth of the Group III nitride material is continued merging the Group III nitride material that is grown atop the mesa surface portions. When the Group III nitride material located atop the mesa surface portions merge, the Group III nitride material growth on the recessed surface ceases. The merged Group III nitride material forms a first Group III nitride material structure, and the Group III nitride material formed in the recessed surface forms a second material structure. The first and second material structures are disjoined from each other and are separated by an air gap.
A semiconductor structure comprising:
Dependencies are inferred from the claim text.