Method for manufacturing semiconductor device, and semiconductor device

A method for manufacturing a semiconductor device, comprising:

• readying each of a semiconductor element, a substrate having Cu as a principal element at least on a surface, and a ZnAl eutectic solder chip having a smaller shape than that of the semiconductor element;
• disposing the semiconductor element and the substrate so that respective bonding surfaces face each other, and sandwiching the ZnAl eutectic solder chip between the substrate and the semiconductor element;
• increasing the temperature of the ZnAl eutectic solder chip sandwiched between the substrate and the semiconductor element while applying a load to the ZnAl eutectic solder chip such that the ZnAl eutectic solder chip melts to form a ZnAl solder layer;
• and
• reducing the temperature of the ZnAl solder layer while applying a load to the ZnAl solder layer such that an eutectic phase structure content of the ZnAl solder layer is entirely decreased in comparison to an eutectic phase structure content of the ZnAl eutectic solder chip.