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US 2014/0191185 A1Published application
Apparatus and method for fabricating nano resonator using laser interference lithography
AssigneesKorea University Industrial & Academic Collaboration Foundation, Samsung Electronics Co., Ltd.
InventorsDuck Hwan KIM, In Sang SONG, Jea Shik SHIN, Ho Soo PARK, Jae-Sung RIEH, Byeong Kwon JU
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Abstract
A method of fabricating a nano resonator, includes forming a line pattern in a first substrate, and transferring the line pattern to a second substrate including a gate electrode. The method further includes forming a source electrode and a drain electrode on the transferred line pattern.
Claims20
A nano resonator comprising:
- a gate electrode formed on a substrate;
- and
- a line pattern formed over the gate electrode and connecting a source electrode to a drain electrode.
A method of fabricating a nano resonator, the method comprising:
- forming a line pattern in a first substrate;
- transferring the line pattern to a second substrate comprising a gate electrode;
- and
- forming a source electrode and a drain electrode on the transferred line pattern.
1 more element
An apparatus that fabricates a nano resonator, the apparatus comprising:
- a line pattern forming unit configured to form a line pattern in a first substrate;
- a line pattern transferring unit configured to transfer the line pattern to a second substrate comprising a gate electrode;
- and
- an electrode forming unit configured to form a source electrode and a drain electrode on the transferred line pattern.
1 more element
Dependencies are inferred from the claim text.