Method for preparing samples for imaging
AssigneeFEI Company
InventorsMichael Schmidt, Jeffrey Blackwood, Stacey Stone, Sang Hoon Lee, Ronald Kelley
Life of this patent
Estimating the term…
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AssigneeFEI Company
InventorsMichael Schmidt, Jeffrey Blackwood, Stacey Stone, Sang Hoon Lee, Ronald Kelley
Estimating the term…
A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
A method of preparing a sample for analysis, the method comprising:
An charged particle beam apparatus comprising:
Dependencies are inferred from the claim text.