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US 2014/0190636 A1Published application
Substrate processing apparatus
AssigneeSamsung Display Co., Ltd.
InventorDong-Seok Shin
Life of this patent
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Abstract
A substrate processing apparatus includes a processing chamber for processing a substrate, a shield at an inner wall of the processing chamber, and a connector attaching the shield to the inner wall of the processing chamber. The connector includes a groove and a protrusion respectively on opposing surfaces of the inner wall of the processing chamber and the shield.
Claims13
A substrate processing apparatus comprising:
- a processing chamber for processing a substrate;
- a shield at an inner wall of the processing chamber;
- and
- a connector attaching the shield to the inner wall of the processing chamber, the connector including a groove and a protrusion respectively on opposing surfaces of the inner wall of the processing chamber and the shield.
1 more element
Dependencies are inferred from the claim text.