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US 2014/0179583 A1Published application
Peeling liquid for a resist
AssigneeBoe Technology Group Co., Ltd.
InventorsShi SHU, Lu LIU, Can Wang, Yonglian QI, Guanbao HUI
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AssigneeBoe Technology Group Co., Ltd.
InventorsShi SHU, Lu LIU, Can Wang, Yonglian QI, Guanbao HUI
Estimating the term…
The invention discloses a peeling liquid for a resist, which relates to an optical element and is used for removing the color resist and the protective layer on a color filter rapidly and efficiently. The peeling liquid for a color resist on a color filter comprises an alkali metal alkoxide with a mass percentage of 10-45%, an organic amine with a mass percentage of 10-30%, a surfactant with a mass percentage of 5-30%, a solvent with a mass percentage of 20-60%, and an alcohol with a mass percentage of 1-55% in terms of the peeling liquid for a resist with a mass percentage of 100%. The peeling liquid for a resist in invention is used for removing the color resist and the protective layer of the substandard product in a color filter.
A peeling liquid for a resist, characterized by comprising an alkali metal alkoxide with a mass percentage of 10-45%, an organic amine with a mass percentage of 10-30%, a surfactant with a mass percentage of 5-30%, a solvent with a mass percentage of 20-60%, and an alcohol with a mass percentage of 1-55% in terms of the peeling liquid for a resist with a mass percentage of 100%.
Dependencies are inferred from the claim text.