Heteroleptic (allyl)(pyrroles-2-aldiminate) metal-containing precursors, their synthesis and vapor deposition thereof to deposit metal-containing films
AssigneesAmerican Air Liquide, Inc., L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des Procedes Georges Claude
InventorsClement Lansalot-matras, Andrey V. Korolev
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Abstract
Disclosed are metal-containing precursors having the formula Compound (I) wherein: —M is a metal selected from Ni, Co, Mn, Pd; and —each of R-1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 are independently selected from H; a C1-C4 linear, branched, or cyclic alkyl group; a C1-C4 linear, branched, or cyclic alkylsilyl group (mono, bis, or tris alkyl); a C1-C4 linear, branched, or cyclic alkylamino group; or a C1-C4 linear, branched, or cyclic fluoroalkyl group. Also disclosed are methods of synthesizing and using the disclosed metal-containing precursors to deposit metal-containing films on a substrate via a vapor deposition process.
Claims20
A metal-containing precursor having the formula:
- wherein
- M is a metal selected from the group consisting of Ni, Co, Mn, and Pd;
- and
- each of R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 are independently selected from H;
- a C1-C4 linear, branched, or cyclic alkyl group;
- a C1-C4 linear, branched, or cyclic alkylsilyl group (mono, bis, or tris alkyl);
- a C1-C4 linear, branched, or cyclic alkylamino group;
- or a C1-C4 linear, branched, or cyclic fluoroalkyl group.
A process for the deposition of a metal-containing film on a substrate, comprising the steps of:
- introducing at least one metal-containing precursor into a reactor having at least one substrate disposed therein, the at least one metal-containing precursor having the formula:
- wherein
- M is a metal selected from the group consisting of Ni, Co, Mn, and Pd;
- and
- each of R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 are independently selected from H;
- a C1-C4 linear, branched, or cyclic alkyl group;
- a C1-C4 linear, branched, or cyclic alkylsilyl group (mono, bis, or tris alkyl);
- a C1-C4 linear, branched, or cyclic alkylamino group;
- or a C1-C4 linear, branched, or cyclic fluoroalkyl group;
- and
- depositing at least part of the metal-containing precursor onto the at least one substrate to form a metal-containing film.
Dependencies are inferred from the claim text.