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US 2014/0179097 A1Published application
Deposition apparatus and method
AssigneeLam Research Corporation
InventorsDiane J. HYMES, Stephen M. SIRARD
Life of this patent
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Abstract
A method for filling features in a layer over a substrate is provided. A dispersion of nanoparticles less than 5 nm is placed on the layer. The liquid is frozen by lowering a temperature of the liquid. The frozen liquid is sublimated by decreasing pressure and subsequently heating the frozen liquid, wherein the nanoparticles are not sublimated.
Claims18
A method for filling features in a layer over a substrate, comprising:
- placing on the layer a liquid with a dispersion of nanoparticles less than 5 nm;
- freezing the liquid by lowering a temperature of the liquid;
- and
- sublimating the frozen liquid by decreasing pressure and subsequently heating the frozen liquid, wherein the nanoparticles are not sublimated.
1 more element
An apparatus for filling features in a layer, comprising:
- a chamber for holding the layer;
- a chuck for supporting the layer within the chamber;
- a motor for spinning the chuck;
- a dispenser for dispensing a liquid with a dispersion of nanoparticles less than 5 nm on the layer for filling the features;
- a cooling system for cooling the liquid on the layer to cause the liquid to freeze;
- a pressure control system for lowering pressure within the chamber;
- and
- a heating system for heating the frozen liquid at the lower pressure to enable sublimation of the frozen liquid.
5 more elements
Dependencies are inferred from the claim text.