Photosensitive polyimide and negative type photoresist composition containing the same
AssigneeIndustrial Technology Research Institute
InventorsChen-Lung LIN, Fu-Shun HSU, Kuo-Chan CHIOU
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Abstract
A photosensitive polyimide and negative type photo-resist composition containing the same are provided. The photosensitive polyimide is represented by formula (I): wherein X1 and X3 are the same or different organic functional groups having four covalent bonds; X2 and X4 are the same or different organic functional groups having two covalent bonds, and X2 contains functional groups of OH or COOH and any one selected from the functional groups below: wherein R is H or CH3, p and q are integers of 1 to 20, and m and n in formula (I) are numbers of repeat units.
Claims17
A photosensitive polyimide of Formula (I):
- wherein X1 and X3 are the same or different organic functional groups having four covalent bonds;
- X2 and X4 are the same or different organic functional groups having two covalent bonds, and wherein X2 is a combination of:
- or a combination of:
- wherein Y1 is selected from a group consisting of:
- —O—, —CO—, —S—, —SO2—, —C(CH3)2—, —C(CF3)2—, —(CH2)n1—, —O(CH2)n2O—, —COO(CH2)n3OCO—,
- wherein n1, n2 and n3 are an integer of 1 to 10;
- R1 is OH or COOH;
- R2 is selected from a group consisting of:
- wherein R is H or CH3, p is an integer of 1 to 20, and q is an integer of 1 to 20;
- and
- m and n in Formula (I) are the number of repeated units, wherein m is an integer of 10 to 1000, and n is an integer of 10 to 1000.
A negative type photoresist composition, comprising:
- 100 parts by weight of a photosensitive polyimide;
- 20 to 150 parts by weight of a photocrosslinking agent;
- and
- 0.01 to 20 parts by weight of a photoinitiator
- , wherein the photosensitive polyimide at least includes a photosensitive polyimide of Formula (I):
- wherein X1 and X3 are the same or different organic functional groups having four covalent bonds;
- X2 and X4 are the same or different organic functional groups having two covalent bonds, and wherein X2 is a combination of:
- or a combination of:
- wherein Y1 is selected from a group consisting of:
- —O—, —CO—, —S—, —SO2—, —C(CH3)2—, —C(CF3)2—, —(CH2)n1—, —O(CH2)n2O—, —COO(CH2)n3OCO—,
- wherein n1, n2 and n3 are an integer of 1 to 10;
- R1 is OH or COOH;
- R2 is selected from a group consisting of:
- wherein R is H or CH3, p is an integer of 1 to 20, and q is an integer of 1 to 20;
- and
- m and n in Formula (I) are the number of repeated units, wherein m is an integer of 10 to 1000, and n is an integer of 10 to 1000.
Dependencies are inferred from the claim text.