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US 2014/0178819 A1Published application
Photosensitive polysiloxane composition and applications thereof
AssigneeChi Mei Corporation
InventorsMING-JU WU, CHUN-AN SHIH
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Abstract
A phontosensitive polysiloxane composition for forming a protective film having superior sensitivity is disclosed. A protective film formed from the phontosensitive polysiloxane composition and an element including the protective film are also disclosed. The phontosensitive polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonic acid ester, a urethane(meth)acrylate compound having at least six (meth)acryloyl groups in a molecule, and a solvent.
Claims7
A phontosensitive polysiloxane composition, comprising:
- a polysiloxane,
- an o-naphthoquinonediazidesulfonic acid ester,
- a urethane(meth)acrylate compound having at least six (meth)acryloyl groups in a molecule, and
- a solvent.
1 more element
Dependencies are inferred from the claim text.