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US 2014/0178805 A1Published application
Pellicle for lithogrpahy
AssigneeShin-Etsu Chemical Co., Ltd.
InventorToru Shirasaki
Life of this patent
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Abstract
There is provided a pellicle wherein the frame is cut with one or more slight-chamfers, and in particular the one cut along the inner edge of the upper annular face of the frame, to which the pellicle membrane is glued, has a slope greater than 45 degrees so that the pellicle membrane when slackened does not touch the lower ridge of the slight chamfer.
Claims4
A pellicle for lithography comprising:
- (i) a pellicle membrane and
- (ii) a pellicle frame, to an upper annular face of which the pellicle membrane is tensely adhered, wherein the angle of a slight-chamfering formed along an inner edge of the upper annular face of the frame to which the pellicle membrane is adhered is less than 45 degrees.
Dependencies are inferred from the claim text.