Reticle, exposure apparatus including the same, and exposure method

An exposure apparatus, comprising:

• a light source emitting light for performing an exposure process;
• a reticle comprising an exposure region that is to be exposed to light during an exposure process, a non-exposure region surrounding the exposure region and not to be exposed to the light during the exposure process, and exposure monitoring keys disposed across a boundary between the exposure region and the non-exposure region;
• and
• a blind disposed between the light source and the reticle and comprising an open region so that a part of the light emitted from the light may reach the exposure region of the reticle.

An exposure method, comprising:

• providing a reticle comprising an exposure region that is to be exposed to light during an exposure process, a non-exposure region surrounding the exposure region and not to be exposed to the light, and exposure monitoring keys disposed to cross a boundary between the exposure region and the non-exposure region;
• emitting light from a light source;
• transmitting a first part of the light emitted from the light source and blocking a second part of the light by using a blind;
• and
• projecting images of target patterns of the reticle and partial images of the exposure monitoring keys formed on the reticle onto a substrate by using the first part of the light.