Apparatus And Methods For Symmetrical Gas Distribution With High Purge Efficiency
OwnerChien-Teh Kao, Mei Chang +4inventors
InventorsChien-Teh Kao, Mei Chang, Hyman Lam, Joel M. Huston, Xiaoxiong Yuan, Olkan Cuvalci
Life of this patent
Estimating the term…
Abstract
Provided are apparatus and methods for depositing materials by vapor deposition and plasma enhanced vapor deposition techniques, and more particularly a gas distribution assembly and vapor deposition chamber to deposit a material. The gas distribution assembly comprises a plurality of sections with each section containing a flow channel with passages extending from the flow channel to the processing region of a processing chamber.
Claims20
A gas distribution assembly comprising:
- a showerhead comprising a body with a first surface and a second surface, the showerhead divided into a plurality of sections;
- each of the plurality of sections comprising a flow channel extending through the body of the showerhead, the flow channel including an inlet end and an outlet end, the inlet end in fluid communication with an inlet and the outlet end in fluid communication with an outlet;
- and
- a plurality of passages extending from the flow channel through the body to the first surface to form an aperture on the first surface so that a gas in the flow channel can flow through the passages and out of the apertures on the first surface.
A chamber for plasma enhanced processing of one or more substrates, the chamber comprising:
- a chamber body defining a process volume;
- a substrate support disposed in the process volume to support one or more substrates;
- a showerhead comprising a body with a first surface and a second surface, the showerhead divided into a plurality of sections, each of the plurality of sections comprising a flow channel extending through the body of the showerhead, the flow channel including an inlet end and an outlet end, the inlet end in fluid communication with an inlet and the outlet end in fluid communication with an outlet and a plurality of passages extending from the flow channel through the body to the first surface to form an aperture on the first surface so that a gas in the flow channel can flow through the passages and out of the apertures on the first surface;
- a plasma forming gas source coupled with the showerhead;
- and
- a reactant gas source coupled with the showerhead.
A gas distribution assembly comprising:
- a showerhead comprising a body with a first surface and a second surface, the showerhead divided into a plurality of sections;
- each of the plurality of sections comprising an upper flow channel extending through the body of the showerhead and a lower flow channel extending through the body of the showerhead, each flow channel including an inlet end and an outlet end, the inlet end in fluid communication with an inlet and the outlet end in fluid communication with an outlet;
- a plurality of passages extending from the upper flow channel through the body to the first surface to form an aperture on the first surface so that a gas in the upper flow channel can flow through the passages and out of the apertures on the first surface, wherein at least some of the passageways include an angled portion to offset the flow of gas through the passageway;
- and
- a plurality of passages extending from the lower flow channel through the body to the first surface to form an aperture on the first surface so that a gas in the lower flow channel can flow through the passages and out of the apertures on the first surface, wherein at least some of the passageways include an angled portion to offset the flow of gas through the passageway.
Dependencies are inferred from the claim text.