Heated backing plate
AssigneeApplied Materials, Inc.
InventorsJrjyan Jerry CHEN, Soo Young CHOI, Young Jin CHOI, Yi CUI, Beom Soo PARK, Robin L. TINER
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Abstract
The present invention generally relates to a heated backing plate coupled to a gas distribution showerhead in a PECVD chamber. The backing plate is heated by circulating a heating fluid either through channels formed within the backing plate or a tube coupled to the backing plate. A heated backing plate heats up the gas distribution showerhead, which improves the cleaning rate of the PECVD chamber that performs low temperature processes.
Claims16
A plasma enhanced chemical vapor deposition chamber, comprising:
- a gas distribution showerhead;
- a backing plate coupled to the gas distribution showerhead, the backing plate having a first surface facing the gas distribution showerhead and a second, substantially planar surface opposite the first surface;
- at least one tube disposed over at least a portion of the second surface of the backing plate;
- and
- one or more clamps coupling the at least one tube to the second surface of the backing plate.
A plasma enhanced chemical vapor deposition chamber, comprising:
- a gas distribution showerhead;
- a backing plate coupled to the gas distribution showerhead, the backing plate having a plurality of channels formed therein;
- and
- a plurality of tubes connecting the ends of the plurality of channels.
Dependencies are inferred from the claim text.