Magnetic Field Assisted Deposition
AssigneeVeeco ALD Inc.
InventorSang In Lee
Life of this patent
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Abstract
Embodiments relate to applying a magnetic field across the paths of injected polar precursor molecules to cause spiral movement of the precursor molecules relative to the surface of a substrate. When the polar precursor molecules arrive at the surface of the substrate, the polar precursor molecules make lateral movements on the surface due to their inertia. Such lateral movements of the polar precursor molecules increase the chance that the molecules would find and settle at sites (e.g., nucleation sites, broken bonds and stepped surface locations) or react on the surface of the substrate. Due to the increased chance of absorption or reaction of the polar precursor molecules, the injection time or injection iterations may be reduced.
Claims9
An apparatus for depositing a layer on a substrate, comprising:
- a process chamber;
- a reactor at least partially enclosed in a process chamber, the reactor comprising electrodes for generating radicals as precursor molecules, the reactor formed with a reaction chamber in which the precursor molecules travel to a surface of the substrate;
- a plurality of magnets within the processor chamber and attached to the reactor, the plurality of magnets configured to generate a magnetic field within the reaction chamber, the magnetic field traversing paths of the precursor molecules to the substrate to cause spiral movements of the precursor molecules relative to a surface of the substrate;
- and
- a mechanism coupled to the substrate of the body to cause relative motion between the body and the substrate.
Dependencies are inferred from the claim text.