Back to results
US 2014/0154629 A1Published application
Lithography apparatus and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorHiromi Kinebuchi
Life of this patent
Estimating the term…
Abstract
A lithography apparatus that performs drawing on a substrate with an energy beam based on bitmap data generated via an error diffusion from pattern data includes a smoothing device configured to perform smoothing on the pattern data before the error diffusion.
Claims13
A lithography apparatus that performs drawing on a substrate with an energy beam based on bitmap data generated via error diffusion from pattern data, the lithography apparatus comprising:
- a smoothing device configured to perform smoothing on the pattern data before the error diffusion.
A method of manufacturing an article, the method comprising:
- forming a pattern on a substrate using a lithography apparatus;
- and
- developing the substrate, on which the pattern has been formed, to manufacturing the article,
- wherein the lithography apparatus performs drawing on the substrate with an energy beam based on bitmap data generated via error diffusion from pattern data, the lithography apparatus including:
- a smoothing device configured to perform smoothing on the pattern data before the error diffusion.
2 more elements
Dependencies are inferred from the claim text.