Substrate structure and manufacturing method thereof

A manufacturing method of a substrate structure, comprising:

• providing an insulation base material, the insulation base material having an upper surface and a lower surface opposite to each other;
• performing first laser treatment on the upper surface of the insulation base material to form a first opening;
• performing second laser treatment on the lower surface of the insulation base material to form a second opening, wherein the second opening communicates with the first opening, and the communicated first and second openings define an initial neck end portion;
• and
• performing third laser treatment on the upper surface or the lower surface of the insulation base material according to a location of the initial neck end portion to form a third opening, wherein the first opening, the second opening, and the third opening are communicated with one another and define a through hole, the third opening is located between the first opening and the second opening, a first included angle is formed between an inner wall of the first opening and an inner wall of the third opening, a second included angle is formed between an inner wall of the second opening and the inner wall of the third opening, a minimum diameter of the third opening is at a center of the through hole and defines a neck end portion, and diameters of the first opening and the second opening gradually decrease in a direction toward the neck end portion.