Method and apparatus capable of synthesizing high-density wires in pores and on surface of porous material

An apparatus for synthesizing nanowires on a substrate, the apparatus comprising:

• a deposition chamber which performs a deposition process of depositing a predetermined material on a substrate placed on a mounting part, and
• a gas feed system which feeds a reactant gas to the deposition chamber,
• wherein the gas feed system comprises:
• a reactant source that is connected to the deposition chamber and supplies a reactant required for deposition inside the deposition chamber, and
• a carrier gas source that is connected to the deposition chamber and the reactant source and supplies a carrier gas carrying the reactant into the deposition chamber,
• wherein the deposition chamber comprises:
• a reaction furnace that can stay in vacuum and at high temperature and has one end connected to the carrier gas source and the reactant source and the other end connected to a vacuum pump, and
• a heating element that is disposed around the reaction furnace and is configured to heat the reaction furnace,
• wherein a substrate on which nanowires are to be synthesized and a covering are disposed inside the reaction furnace, the covering being spaced apart by a predetermined gap from the substrate, and
• wherein inside the reaction chamber, a gas of the reactant source is deposited on the substrate while flowing through the gap between the substrate and the covering, thereby synthesizing nanowires.