US 2014/0154399 A1 · CONTROLLING THE UNIFORMITY OF PECVD DEPOSITION

Abstract

A method and apparatus for plasma modifying a workpiece such as a syringe barrel, cartridge barrel, vial, or blood tube is described. Plasma is provided within the lumen of the workpiece. The plasma is provided under conditions effective for plasma modification of a surface of the workpiece. A magnetic field is provided in at least a portion of the lumen. The magnetic field has an orientation and field strength effective to improve the uniformity of plasma modification of the interior surface of the generally cylindrical wall. A vessel made according to the process or using the apparatus described above. A pharmaceutical package comprising the syringe barrel or vial containing a pharmaceutical preparation, secured with a closure.

Claims41

Dependent claims

A method of plasma modifying a syringe barrel or cartridge barrel having a surface to be treated, the method comprising:

providing plasma in or near the surface under conditions effective for plasma modification of the surface of the syringe barrel or cartridge barrel;
and
at least part of the time while providing plasma, providing a magnetic field in or near the plasma, the magnetic field having a position, orientation, and field strength effective to improve the uniformity, density, or both of plasma modification of the surface of the syringe barrel or cartridge barrel, in which the uniformity of plasma modification is expressed as a ratio of:
one standard deviation of coating thickness/mean coating thickness and the ratio is from 0.5 to 0.2.

1 more element

Dependencies are inferred from the claim text.

Controlling the uniformity of pecvd deposition

Life of this patent

Controlling the uniformity of pecvd deposition

Life of this patent

Abstract

Claims41