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US 2014/0152991 A1Published application
Level Sensor of Exposure Apparatus and Wafer-Leveling Methods Using the Same
AssigneeSamsung Electronics Co., Ltd.
InventorsJinseok Heo, Jeongho Yeo
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Abstract
A level sensor of an exposure apparatus includes a light source that generates light that is illuminated onto a top surface of a wafer, a projection part provided in a path of incident light propagating from the light source to the wafer and having a single first slit, a detection part provided in a path of light reflected from the wafer and having a single second slit, and a detector that detects the reflected light that is incident on the second slit of the detection part.
Claims9
A level sensor of an exposure apparatus, comprising:
- a light source that generates light that is illuminated onto a top surface of a wafer;
- a projection part provided in a path of incident light propagating from the light source to the wafer, the projection part having a single first slit;
- a detection part provided in a path of reflected light that is reflected from the wafer, the detection part having a single second slit;
- and
- a detector that detects the reflected light that passes through the second slit of the detection part.
2 more elements
-14. (canceled)
Dependencies are inferred from the claim text.