Lithographic apparatus and device manufacturing method
AssigneeASML Netherland B.V.
InventorsArno Jan Bleeker, Laurentius Cornelius De Winter
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Abstract
A lithographic apparatus is provided and configured to project a patterned beam of radiation onto a substrate. The apparatus has a measurement system to provide measurement data related to a thickness of a resist layer on the substrate, and a controller to control the operation of the lithographic apparatus such that a radiation intensity level in the patterned beam to be projected onto the substrate is controlled based on the measurement data.
Claims19
A lithographic apparatus, configured to project a patterned beam of radiation onto a substrate, the apparatus comprising:
- a measurement system, configured to provide measurement data related to a thickness of a resist layer on the substrate;
- and
- a controller, configured to control the operation of the lithographic apparatus such that a radiation intensity level in the patterned beam to be projected onto the substrate is controlled based on the measurement data.
A device manufacturing method, comprising:
- using a lithographic apparatus to project a patterned beam of radiation onto a substrate;
- obtaining measurement data related to a thickness of a resist layer on the substrate;
- and
- controlling the operation of the lithographic apparatus to control the radiation intensity level in the patterned beam to be projected onto the substrate based on the measurement data.
Dependencies are inferred from the claim text.