Solid-state imaging device

A solid-state imaging device comprising:

• a semiconductor substrate;
• a plurality of photoelectric conversion units disposed in the semiconductor substrate so as to form a matrix along a main surface of the semiconductor substrate;
• a wiring layer disposed above the semiconductor substrate;
• a plurality of color filters disposed above the wiring layer, the color filters each corresponding to a different one of the photoelectric conversion units, and thus forming a matrix;
• and
• a barrier wall disposed above the wiring layer and between adjacent ones of the color filters, wherein
• the color filters are composed of a plurality of first color filters and a plurality of second color filters, and
• in plan view from a direction perpendicular to the main surface of the semiconductor substrate,
• in the matrix formed by the color filters, the first color filters and the second color filters are arranged alternately in each of a row direction and a column direction, and thus form a checkerboard pattern,
• the first color filters are greater than the second color filters in terms of area, and
• each one of the first color filters, at a corner portion thereof, (i) has an oblique side that extends diagonally with respect to the row direction and the column direction, and (ii) is adjacent to another one of the first color filters that is located diagonally therefrom, the each one of the first color filters being partitioned from the another one of the first color filters by a shift portion of the barrier wall that extends in parallel with the oblique side.