Plasma pulse tracking system and method
AssigneeComet Technologies USA, Inc.
InventorJack Gilmore
Life of this patent
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AssigneeComet Technologies USA, Inc.
InventorJack Gilmore
Estimating the term…
A plasma processing system may include a radio frequency (RF) generator configured to supply a pulsing process signal to a target in a plasma processing chamber via a RF matching network. A phase and magnitude detector circuit is coupled to the RF generator and configured to sense the pulsing process signal and output a magnitude error signal and a phase error signal. A pulse tracking circuit is electrically coupled to the phase and magnitude detector circuit and configured to receive the magnitude error signal and the phase error signal and output a tracked magnitude signal and a tracked phase signal. A match controller is electrically coupled to the pulse tracking circuit and the RF matching network and configured to receive the tracked magnitude signal and the tracked phase signal and vary an impedance of the RF matching network in response to the tracked magnitude and phase signals.
A method of tuning a first radio frequency (RF) matching network during a pulsed mode operation, comprising:
A system for tuning a first radio frequency (RF) matching network during pulsed mode operation, comprising:
A method of tuning a first radio frequency (RF) matching network of a plasma chamber during pulse mode operation, the method comprising:
Dependencies are inferred from the claim text.