Layered product for fine pattern formation and method of manufacturing layered product for fine pattern formation

A layered product for fine pattern formation used to form a fine pattern in a processing object using a first mask layer, comprising:

• a mold having a concavo-convex structure on its surface;
• and
• a second mask layer serving as a mask when the first mask layer is fabricated,
• wherein a distance (lcc) between a top position (S) of a convex portion of the concavo-convex structure and an interfacial position (Scc) of the second mask layer formed in the concave portion of the concavo-convex structure and a height (h) of the concavo-convex structure satisfy Formula (1) 0<lcc<1.0 h, and a distance (lcv) between the top position (S) of the convex portion and a top position (Scv) of the second mask layer formed on the convex portion and the height (h) satisfy Formula (2) 0≦lcv≦0.05 h.

A layered product for fine pattern formation comprising:

• a processing object;
• a first mask layer that is provided on a principal surface of the processing object and has a concavo-convex structure on its surface;
• and
• a second mask layer provided on the concavo-convex structure of the first mask layer,
• wherein the second mask layer is arranged in at least a part of a convex portion and side portion of the concavo-convex structure,
• a ratio (hmv/h0) between a thickness (hmv) of the second mask layer arranged on the convex portion of the concavo-convex structure and a height (h0) of the concavo-convex structure represented by a distance between a bottom of the concave portion of the concavo-convex structure and a top of the convex portion satisfy Formula (16) 0<hmv/h0≦20, and
• a ratio (hml/hmv) between a thickness (hml) of the second mask layer arranged on a side face portion of the concavo-convex structure and a thickness (hmv) of the second mask layer arranged on the convex portion of the concavo-convex structure satisfies Formula (17) 0≦hml/hmv<1.

A layered product for fine pattern formation comprising:

• a processing object;
• a first mask layer that is provided on a principal surface of the processing object and has a concavo-convex structure on its surface;
• and
• a second mask layer provided on the concavo-convex structure of the first mask layer,
• wherein a distance (lcc) between a top position (S) of a convex portion of the concavo-convex structure and an interfacial position (Scc) of the second mask layer formed in the concave portion of the concavo-convex structure and a height (h) of the concavo-convex structure satisfy Formula (1) 0<lcc<1.0 h,
• a distance (lcv) between the top position (S) of the convex portion and a top position (Scv) of the second mask layer formed on the convex portion of the concavo-convex structure satisfies Formula (20) 0≦lcv<h−lcc, and
• a thickness of the first mask layer represented by a distance between an interface between the first mask layer and the processing object and a top position (S) of the convex portion is 50 nm or larger and 1500 nm or smaller.

A method of manufacturing a fine pattern structure, comprising in this order:

• a mold formation step of consecutively transferring a concavo-convex structure provided on a surface of a cylindrical master using an optical transfer method to form a concavo-convex structure on a principal surface of a film-like substrate to obtain a first film-like mold;
• a second mask layer filling step of coating a solution of a second mask layer material on a surface having the concavo-convex structure of the first film-like mold to form a second mask layer in the concave portion of the concavo-convex structure;
• a first mask layer forming step of coating a solution of the first mask layer material on the surface having the concavo-convex structure, which filled by the second mask layer, of the first film-like mold, to form a first mask layer so as to cover the concavo-convex structure and the second mask layer;
• a thermal laminating step of thermally laminating the first mask layer to a principal surface of the processing object;
• a step of irradiating energy rays onto the first mask layer;
• a step of releasing the first film-like mold to obtain a layered product including the second mask layer, the first mask layer, and the processing object;
• a first dry etching step of performing a first dry etching to etch the first mask layer of the layered product by using the second mask layer as a mask to expose a part of the processing object;
• and
• a second dry etching step of performing a second dry etching to etch the processing object under a condition different from that of the first dry etching.

A method of manufacturing a fine pattern structure, sequentially comprising in this order:

• a first mold formation step of consecutively transferring a concavo-convex structure provided on a surface of a cylindrical master using an optical transfer method to form a concavo-convex structure on a principal surface of a film-like substrate to obtain a first film-like mold;
• a second mold formation step of consecutively transferring a concavo-convex structure of the first film-like mold using an optical transfer method to form a concavo-convex structure on a principal surface of a film-like substrate to obtain a second film-like mold;
• a second mask layer filling step of coating a solution of a second mask layer material on a surface having the concavo-convex structure of the second film-like mold to form a second mask layer in the concave portion of the concavo-convex structure;
• a first mask layer formation step of coating a solution of the first mask layer material on the surface having the concavo-convex structure, which is filled by the second mask layer, of the second film-like mold to form a first mask layer so as to cover the concavo-convex structure and the second mask layer;
• a thermal laminating step of thermally laminating the first mask layer to a principal surface of the processing object;
• a step of irradiating energy rays onto the first mask layer;
• a step of releasing the second film-like mold to obtain a layered product including the second mask layer, a first mask layer, and a processing object;
• a first dry etching step performing a first dry etching to etch the first mask layer of the layered product by using the second mask layer as a mask to expose a part of the processing object;
• and
• a second dry etching step of performing a second dry etching to etch the processing object under a condition different from that of the first dry etching.