Alignment of light source focus
AssigneeASML Netherlands B.V.
InventorsMatthew R. Graham, William N. Partlo, Steven Chang, Robert A. Bergstedt
Life of this patent
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AssigneeASML Netherlands B.V.
InventorsMatthew R. Graham, William N. Partlo, Steven Chang, Robert A. Bergstedt
Estimating the term…
An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.
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A method comprising:
An extreme ultraviolet light system comprising:
Dependencies are inferred from the claim text.