Gas mixture method and apparatus for generating ion beam
AssigneeAdvanced Ion Beam Technology, Inc.
InventorsWei-Cheng LIN, Zhimin WAN, Koulin HU
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Abstract
A gas mixture method and apparatus of prolonging lifetime of an ion source for generating an ion beam particularly an ion beam containing carbon is proposed here. By mixing the dopant gas and the minor gas together to generate an ion beam, undesired reaction between the gas species and the ion source can be mitigated and thus lifetime of the ion source can be prolonged. Accordingly, quality of ion beam can be maintained.
Claims44
A gas mixture method of prolonging lifetime of an ion source for generating an ion beam comprising:
- supplying a dopant gas into a container, wherein the dopant gas is a carbon-containing gas used for generating carbon-containing ions;
- and
- supplying a minor gas into the container to dilute the dopant gas for prolonging lifetime of the ion source, wherein the minor gas can be H2, CF4, Xe, Kr, Ar, PH3, AsH3, CH4 or any combination thereof;
- and
- providing a gas mixture in the ion source chamber to generate the ion beam after mixing the dopant gas and the minor gas at a mixture ratio in the container, wherein the mixture ratio is volume ratio.
(canceled)
A gas mixture apparatus of prolonging lifetime of an ion source for generating an ion beam comprising:
- an ion source chamber having an anode and a cathode;
- a dopant gas, wherein the dopant gas is a carbon-containing gas used for generating carbon-containing ions in the ion source chamber;
- and
- a minor gas to dilute the dopant gas in the ion source chamber at a mixture ratio for prolonging lifetime of the ion source, wherein the minor gas can be H2, CF4, Xe, Kr, Ar, PH3, AsH3, CH4 or any combination thereof and the mixture ratio is volume ratio.
Dependencies are inferred from the claim text.