Method and apparatus for processing carbon nanotubes
AssigneeTokyo Electron Limited
InventorsTakashi MATSUMOTO, Osayuki Akiyama
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Abstract
A method for processing carbon nanotubes includes positioning in a treatment chamber of a carbon nanotube processing apparatus a substrate having multiple carbon nanotubes bundled together and oriented substantially perpendicular to a surface of the substrate, and introducing a microwave into the treatment chamber from a planar antenna having multiple microwave radiation holes such that plasma of an etching gas is generated and that the plasma etches the carbon nanotubes starting from one end of the carbon nanotubes bundled together.
Claims20
A method for processing carbon nanotubes, comprising:
- positioning in a treatment chamber of a carbon nanotube processing apparatus a substrate having a plurality of carbon nanotubes bundled together and oriented substantially perpendicular to a surface of the substrate;
- and
- introducing a microwave into the treatment chamber from a planar antenna having a plurality of microwave radiation holes such that plasma of an etching gas is generated and that the plasma etches the carbon nanotubes starting from one end of the carbon nanotubes bundled together.
An apparatus for processing carbon nanotubes, comprising:
- a treatment chamber having an opening on top and configured such that a plurality of carbon nanotubes bundled together on a substrate and oriented substantially perpendicular to a surface of the substrate is processed in the treatment chamber;
- a stage configured to hold the substrate in the treatment chamber;
- a dielectric plate configured to cover the opening of the treatment chamber;
- a planar antenna positioned on an outer-side of the dielectric plate and having a plurality of microwave radiation holes configured to introduce a microwave into the treatment chamber;
- a first gas inlet configured to introduce a processing gas into the treatment chamber;
- a second gas inlet configured to introduce a processing gas into the treatment chamber;
- and
- an exhaust duct connected to an exhaust device configured to decompress and evacuate the treatment chamber,
- wherein the first gas inlet is positioned between the dielectric plate and the second gas inlet, the second gas inlet is positioned between the first gas inlet and the stage and has a plurality of gas discharge ports configured to discharge a gas to the carbon nanotubes on the surface of the substrate held on the stage, and at least one of the first gas inlet and the second gas inlet is configured to introduce an etching gas into the treatment chamber such that the plurality of carbon nanotubes is etched.
Dependencies are inferred from the claim text.