Deposition shield for plasma enhanced substrate processing

A process chamber for processing a substrate, comprising:

• a chamber body having an inner volume and a dielectric lid;
• a gas inlet to provide a gas to the inner volume;
• an RF power source disposed above the dielectric lid to couple RF power to the gas during use;
• a substrate support disposed in the inner volume opposite the dielectric lid and having a support surface to support a substrate having a given width;
• and
• a deposition shield comprising one or more plates of a dielectric material supported in the inner volume that prevents any line of sight between the support surface of the substrate support and the dielectric lid.

A method of processing a substrate, comprising:

• forming a plasma in a process chamber using RF power inductively coupled to the plasma from an electrode disposed proximate a dielectric lid of the process chamber;
• processing a substrate disposed on a substrate support in the process chamber while the plasma is maintained;
• and
• providing a deposition shield disposed between the substrate and the dielectric lid while processing the substrate, wherein the deposition shield blocks any line of sight between the substrate and the dielectric lid.