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US 2014/0151330 A1Published application
Methods and materials for removing metals in block copolymers
AssigneeAz Electronic Materials (Luxembourg) S.A.R.L.
InventorsJian YIN, Hengpeng WU, Muthiah THIYAGARAJAN, SungEun HONG, Mark NEISSER, Yi CAO
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Abstract
The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.
Claims11
A method of forming a directed self assembly pattern comprising the steps of;
- a. coating a substrate with a solution with reduced metal ion contamination content, wherein the solution comprises a block copolymer in a non aqueous solvent produced by
- i. treating the solution with a basic ion exchange to form a slurry;
- and,
- ii. filtering the slurry to remove the ion exchange resin;
- b. heating the substrate to form a directed self assembly polymer layer;
- and
- c. removing one block of the block copolymer and thereby forming a pattern.
4 more elements
Dependencies are inferred from the claim text.