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US 2014/0150723 A1Published application
Ion implantation apparatus
AssigneeSen Corporation
InventorsMitsuaki Kabasawa, Kazuhiro Watanabe, Hitoshi Ando, Kouji Inada, Tatsuya Yamada
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Abstract
An ion implantation apparatus includes: a plurality of units for accelerating an ion beam generated in an ion source; and a plurality of units for adjusting a scan beam and implanting ions into a wafer. A horizontal U-shaped folder type beamline having opposite long straight portions includes the plurality of units for adjusting the scan beam in a long straight portion to have substantially the same length as the ion source and the plurality of units for accelerating the ion beam.
Claims11
An ion implantation apparatus comprising:
- a plurality of units for accelerating an ion beam generated in an ion source;
- and
- a plurality of units for adjusting a scan beam and implanting ions into a wafer, wherein
- a horizontal U-shaped loop-back type beamline having opposite long straight portions includes the plurality of units for adjusting the scan beam in a long straight portion to have a length substantially identical to those of the ion source and the plurality of units for accelerating the ion beam.
1 more element
An ion implantation apparatus comprising:
- a first section having a long beamline made by an ion beam generation unit and a high-energy multi-stage linear acceleration unit;
- a second section for changing a trajectory of the ion beam by a deflection unit including an energy filter;
- and
- a third section having a long beamline made by a beam transport line unit including a beam shaper device, a scanner device, an electrostatic parallel lens device, and a final energy filter, wherein
- the first section, the second section, and the third section form a high-energy ion implantation beamline, and
- the first section and the third section are disposed to face each other to form a U-shaped device layout having opposite long straight portions that realize high-energy high-accuracy implantation.
3 more elements
Dependencies are inferred from the claim text.