Exposure apparatus, exposure method, and method for producing device
AssigneeNikon Corporation
InventorTakeyuki MIZUTANI
Life of this patent
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Abstract
An exposure apparatus includes a nozzle member which has at least one of a supply port for supplying a liquid and a recovery port for recovering the liquid, and a nozzle adjusting mechanism which adjusts at least one of a position and a posture of the nozzle member depending on a position or a posture of a substrate. The exposure apparatus forms an immersion area of the liquid on the substrate, and performs exposure for the substrate through the liquid in the immersion area. Accordingly, the liquid is satisfactorily retained between the projection optical system and the substrate, thereby making it possible to realize the exposure highly accurately.
Claims4
An exposure apparatus which exposes a substrate, the exposure apparatus comprising:
- a projection system having a final optical element;
- a holding member configured to hold the final optical element;
- a first nozzle member having a liquid supply port from which immersion liquid is supplied, the first nozzle member being connected to the holding member;
- and
- a second nozzle member having a liquid recovery port from which the supplied immersion liquid is recovered, the second nozzle member being movable relative to the first nozzle member.
An exposure apparatus which exposes a substrate, the exposure apparatus comprising:
- a projection system having a final optical element;
- a holding member having a liquid supply port from which immersion liquid is supplied, the holding member holding the final optical element;
- and
- a nozzle member having a liquid recovery port from which the supplied immersion liquid is recovered, the nozzle member being movable relative to the holding member.
Dependencies are inferred from the claim text.