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US 2014/0111782 A1Published application
Lithography apparatus, method for lithography and stage system
AssigneeSamsung Electronics Co., Ltd.
InventorsJin-Hong PARK, Jeong-Ho YEO, Joo-On PARK, Chang-Min PARK
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Abstract
Provided are a lithography apparatus, a method for lithography and a stage system. The lithography apparatus includes a reticle stage having a reticle, at least one nozzle on at least one surface of the reticle stage and configured to allow shielding gas to flow to a surface of the reticle to form an air curtain, and a gas supply unit configured to supply the nozzle with the shielding gas.
Claims19
A lithography apparatus comprising:
- a reticle stage having a reticle;
- at least one nozzle on at least one surface of the reticle stage and configured to direct shielding gas to flow to a surface of the reticle to form an air curtain;
- and
- a gas supply unit configured to supply the nozzle with the shielding gas.
1 more element
-13. (canceled)
A stage system comprising:
- a reticle stage having a reticle;
- and
- at least one nozzle on at least one surface of the reticle stage and to direct shielding gas to flow to a surface of the reticle to form an air curtain.
A lithography apparatus comprising:
- one or more nozzles on at least one surface of the reticle stage and configured to direct a shielding gas to a surface of a reticle;
- and
- a gas supply unit configured to supply the one or more nozzles with the shielding gas.
Dependencies are inferred from the claim text.