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US 2014/0110609 A1Published application
Systems and methods for optics cleaning in an euv light source
AssigneeCymer, Inc.
InventorsAlexander N. Bykanov, Silvia De Dea, Alexander I. Ershov, Vladimir B. Fleurov, Igor V. Fomenkov, William N. Partlo
Life of this patent
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Abstract
An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.
Claims2
An extreme-ultraviolet (EUV) light source comprising;
- an optic;
- a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic;
- and
- a cleaning system comprising a gas and a secondary light radiator, said secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.
1 more element
A method comprising the steps of:
- providing an optic;
- generating an EUV light emitting plasma for substrate exposure during a burst period, the EUV light emitting plasma producing a deposit on said optic;
- and
- providing a gas and generating a laser produced plasma to produce a cleaning species with the gas during an intervening period.
1 more element
Dependencies are inferred from the claim text.