Methods and systems for lithography process window simulation
AssigneeASML Netherlands B.V.
InventorsJun YE, Yu Cao, Hanying Feng
Life of this patent
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Abstract
A method of efficient simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process.
Claims20
A method implemented by a computer comprising:
- identifying a model of a lithographic process;
- identifying a nominal condition of the lithographic process;
- identifying a process parameter to vary from the nominal condition;
- using, by the computer, the model to generate two or more terms for a polynomial series expansion about the nominal condition as a function of the process parameter;
- and
- generating, using the computer, a simulated image at a specific value of the process parameter utilizing the generated terms.
A non-transitory computer readable storage medium having instructions stored thereon which, when executed by a computer, cause the computer to perform a method comprising:
- identifying a model of a lithographic process;
- identifying a nominal condition of the lithographic process;
- identifying a process parameter to vary from the nominal condition;
- using, by the computer, the model to generate two or more terms for a polynomial series expansion about the nominal condition as a function of the process parameter;
- and
- generating, using the computer, a simulated image at a specific value of the process parameter utilizing the generated terms.
Dependencies are inferred from the claim text.